Latest TechniClean IK73 Residue Cleaner Designed for Advanced Semiconductor

The TechniClean IK73 Residue Cleaner is used for removing highly-inert chemical residues that are created during patterning of high-k dielectric metal oxides such as hafnium, zirconium and tantalum oxides. This removal process is suitable in immersion, batch-spray and single-wafer chemical applications.

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